Chemical vapor generation from liquid sources
Surface modification and thin film growth for semiconductor devices
Low-temperature atomic layer deposition (ALD) and metal-organic chemical vapor deposition (MOCVD)
Production of hydrazine gas, peroxide gas, and hydrogen peroxide gas
Manufacturing of proprietary vapor generation equipment
Hydrazine gas production
Hydrogen peroxide gas production
Surface functionalization and passivation
Atomic layer deposition support
BRUTE Hydrazine
BRUTE Peroxide
Peroxidizer
会社名
Group
親会社
子会社
得意先
仕入先
業務提携
銀行等
株主等
2 件
| 日付 | 概要 |
|---|
| 2005年 |
RASIRC was founded in 2005 by Jeffrey Spiegelman, a serial entrepreneur with a successful history in the semiconductor equipment space. |
| 2005年 |
Founded in 2005, RASIRC uses proprietary technology to generate high purity vapor from liquid sources. ISO 9001-2008 certified, RASIRC develops and manufactures products in California and Colorado targeted at low temperature surface modification and thin film growth. |
2026-06-11 04:56 (Model: ggml-org/gpt-oss-20b )
