Production of high purity vapor from liquid chemical sources
Surface modification and thin film growth for microelectronics
Atomic Layer Deposition (ALD) precursor solutions
Hydrogen peroxide gas generation for semiconductor processing
Hydrazine gas generation for nitride ALD and MOCVD
会社名
Group
親会社
子会社
得意先
仕入先
銀行等
株主等
2026-03-09 07:56 (Model: gpt-oss:20b )