Kurita Manufacturing Co., Ltd.

Founded in Kyoto City as a cooperative factory of Nissin Electric Co., Ltd.

Merged with Hodenki and established Kurita Manufacturing Co., Ltd.

Capital increased to 10 million yen

Newly established Maebashi Factory in Maebashi City, Gunma Prefecture

Relocated to Ujitawara Town, Ujitawara Industrial Park, Kyoto Prefecture

Expanded Maebashi Factory

Capital increased to 20 million yen

Succeeded in developing a "3D Ion Implantation Pulse Power Supply" with the support of the Japan Science and Technology Agency

Developed "RF and High-Voltage Pulse Superposition Method Plasma Ion Implantation Technology" with Osaka Industrial Technology Research Institute (patent application)

Succeeded in developing "High-Adhesion Thick DLC Coating Technology" with support from the Ministry of Economy, Trade and Industry's New Industry Creation Technology Development Subsidy

Started selling as "Plasma Ion Implantation and Film Formation Equipment"

Started DLC coating service business (Kyoto Factory and Maebashi Factory)

Received the Kyoto Prefecture Small and Medium Enterprise Excellent Technology Award for "Development of High-Adhesion Ultra-Thick DLC Coating Technology"

Obtained patents for plasma ion implantation and film formation methods【Patent No. 3517749 and No. 3555928】

Certified by the Kinki Bureau of Economy, Trade and Industry for the "Development of Large Diamond Cutting Tools for High-Precision Processing"

Adopted in the 2006 Strategic Basic Technology Advanced Support Project (Support Point)

Received the Excellent Award at the 2nd Monozukuri Japan Grand Prize (Ministry of Economy, Trade and Industry) for "Ion Implantation and Film Formation Technology that Promotes Environmentally Friendly, Safe, and Energy-Saving DLC Thick Films for Large Industrial Products"

Selected as one of 128 successful industry-academia-government collaboration companies by the Organization for Small & Medium Enterprises and Regional Innovation, Japan

Selected as one of 300 vibrant small and medium enterprises in 2009 by the Small and Medium Enterprise Agency

Adopted in the 2009 Aichi Nano Tech Manufacturing Cluster Project for "Industrialization of Metal Nano Particles Using Continuous Liquid Plasma"

Adopted in the 2010 New Business Activity Promotion Support Subsidy (New Collaboration Support Project) for "Manufacturing and Sales of 6-10 mm Single Crystal Diamond Plates Using Newly Developed Device Method"

Received the Kyoto Prefecture Invention and Idea Meritorious Person Award (Kyoto Governor's Award) for excellence

Received the Kyoto Small and Medium Enterprise Excellent Company Award (Kyoto Governor's Award)

Obtained patent for "Method of Forming DLC Film and DLC Film"【Patent No. 4658506】

Developed and started selling a power supply for liquid plasma generation (1kW/30kHz)

Developed and started selling a power supply for liquid plasma generation with SiC elements, 1kW/200kHz model

Increased capital to 100 million yen

Selected for the Super Cluster Program "Development and Practical Implementation of SiC Multi-Stage High-Voltage and High-Speed Switches for Next-Generation Ion Implantation Surface Modification Equipment." Started development of power supplies with various types of SiC devices

Developed and started selling (launch) a power supply for liquid plasma generation (2kW / 300kHz / SiC)