| 1979年09月 |
Samco International, Inc. was established |
| 1980年07月 |
Released large CVD system for semiconductor process |
| 1981年04月 |
Released Japan’s first MOCVD system |
| 1984年07月 |
Opened Tokyo branch office |
| 1985年06月 |
Moved HQ to current location and started selling products of March Instruments Inc. (now NORDSON CORPORATION) |
| 1987年02月 |
Opened OPTO films research laboratory in Sunnyvale |
| 1990年11月 |
Released LSCVD® system for processing of TEOS SiO2 film |
| 1991年03月 |
Opened R&D Center I in Kyoto |
| 1993年02月 |
Opened Tsukuba Office |
| 1993年09月 |
Opened Tokai Branch |
| 1994年02月 |
Released ferroelectric film deposition system using technology of Symetrix Corporation. |
| 1995年07月 |
Developed the CFC pollution-free technique using thin film technology |
| 1995年12月 |
Released compact reactive ion etching system RIE-10NR |
| 1996年12月 |
Released ICP etching system RIE-101iP |
| 1997年11月 |
Developed DLC (diamond-like carbon) film coating technology on plastic bottles in collaboration with Kirin Brewery Co., Ltd. |
| 1997年11月 |
Released ICP etching system RIE-200iP |
| 1998年12月 |
Released compact PECVD system PD-220 |
| 1999年07月 |
Acquired field support business from Samco Engineering Co., Ltd. |
| 2000年01月 |
Opened Cambridge Research Laboratory at University of Cambridge, UK |
| 2001年05月 |
Became publicly listed in JSDA Over-the-Counter Trading Securites Market |
| 2001年07月 |
Opened Taiwan Office |
| 2002年07月 |
Opened Production Center I in Kyoto |
| 2003年11月 |
Released production type PECVD system PD-220LC |
| 2003年12月 |
Introduced high speed silicon deep etching technology from Robert Bosch GmbH |
| 2004年11月 |
Opened Shanghai Office |
| 2004年12月 |
Changed company name to Samco Inc. |
| 2004年12月 |
Withdrew from JSDA Over-the-Counter Trading Securites Market and became publicly listed in JASDAQ Securities Exchange Market |
| 2005年05月 |
Released plasma CVD system PD-2203L (Cluster Lab) for general purpose |
| 2005年09月 |
Provided to British business the technology of mass-producing ferroelectric-carbon nanotubes which was developed together with University of Cambridge |
| 2005年12月 |
Released compact batch-type plasma cleaning system PC-300 for cleaning electronic substrate |
| 2006年03月 |
Opened Product Service Center |
| 2006年05月 |
Released dry etching system RIE-800iPB for MEMS |
| 2006年09月 |
Signed a collaborative research agreement with Tsinghua University (China) |
| 2007年11月 |
Released ICP etching system RIE-140iP for LD |
| 2008年03月 |
Opened R&D Center II in Kyoto |
| 2008年05月 |
Released production type MOCVD system MCV-2018 for GaN film deposition |
| 2008年10月 |
Established a subsidiary, Samco Global Service Inc., in Taiwan for field support |
| 2008年11月 |
Released production type ICP etching system RIE-330iPC for LED |
| 2009年01月 |
Started running of Samco Global Service Inc. |
| 2009年04月 |
Held 30th anniversary event at Kyoto Hotel Okura |
| 2009年10月 |
Released R&D type dry etching system RIE-400iPB for MEMS |
| 2010年04月 |
Became listed in Osaka Securies Exchange JASDAQ Market (now TSE JASDAQ (standard) market) as a result of the merge of Osaka Securities of Exchange, Co., Ltd. and Jasdaq Securities Exchange, Inc. |
| 2010年07月 |
Released production type plasma CVD system PD-330STC for TSV |
| 2010年07月 |
Released production type plasma CVD system PD-5400 for LED |
| 2010年08月 |
Opened East Coast Office in North Carolina, U.S. (Relocated in New York in May 2014) |
| 2010年09月 |
Opened Beijing Office |
| 2011年12月 |
Released production type ICP etching system RIE-331iPC for LED |
| 2012年11月 |
Released ICP etching system RIE-600iP for SiC power device |
| 2013年07月 |
Transferred Samco’s stock listing to Tokyo Stock Exchange Market Second Section |
| 2013年10月 |
Released production type ICP etching system RIE-600iPC for SiC power device |
| 2013年11月 |
Released production type RIE system RIE-800iPBC for MEMS |
| 2014年01月 |
Transferred Samco’s stock listing to Tokyo Stock Exchange Market First Section |
| 2014年01月 |
Transferred Samco’s stock listing to Tokyo Stock ExchangeMmarket First Section |
| 2014年03月 |
Signed distribution agreement of MOCVD systems with Valence Process Equipment Inc. (U.S.) |
| 2014年05月 |
Acquired UCP Processing (Lichtenstein) as a subsidiary (Later renamed as samco-ucp AG) |
| 2014年09月 |
Opened Fukuoka Office |
| 2015年 |
Released ALD system AL-1 for electronic devices |
| 2015年09月 |
Increased capital to JPY 1.66 billion through public offering |
| 2015年12月 |
Signed distribution agreement of SiC epitaxial CVD system with Epiluvac AB (Sweden) |
| 2015年12月 |
Released ALD system AL-1 for electronic devices |
| 2016年06月 |
Opened Production Center II in Kyoto |
| 2016年08月 |
Opened Malaysia Office |
| 2016年09月 |
Released Aqua Plasma® cleaner AQ-2000 |
| 2018年12月 |
Released compact ICP etching system RIE-200iPN |
| 2019年09月 |
Held 40th anniversary event at Kyoto Hotel Okura |
| 2024年05月 |
先端技術開発棟の建設を開始 |
| 2025年09月 |
先端技術開発棟（京都市伏見区）が完成 |
| 2025年12月 |
原子層レベルの加工を実現するALE装置の開発、販売を開始 |
| 2026年03月 |
2反応室ALD装置AD-8002LPCの開発、販売を開始 |
