| 1966-05 |
資本金100万円で東京化工機株式会社を設立。 |
| 1966-05 |
Established Tokyo Chemical Machinery Co., Ltd. with a capital of 1 million yen |
| 1967-03 |
自動エッチングマシン試作1号機が完成し、エレクトロニクス業界に本格的進出。 |
| 1967-03 |
Completed the first prototype of an automatic etching machine, making a full-scale entry into the electronics industry |
| 1967-03 |
Completed the first prototype of an automatic etching machine, making a full-scale entry into the electronics industry |
| 1970-02 |
エッチングマシン周辺機器の開発に着手し、総合装置メーカーとして展開。 |
| 1970-02 |
Began developing peripheral equipment for etching machines, expanding as a comprehensive equipment manufacturer |
| 1970-02 |
Began developing peripheral equipment for etching machines, expanding as a comprehensive equipment manufacturer |
| 1971-05 |
資本金1,250万円に増資。 |
| 1971-05 |
Increased capital to 12.5 million yen |
| 1971-05 |
資本金1,250万円に増資。 |
| 1973-12 |
塩化第二銅再生装置の開発に成功、国産1号機が誕生。 |
| 1973-12 |
Successfully developed the first domestically produced copper(II) chloride regeneration system |
| 1977-12 |
Roll to Rollフレキシブル基板の製造装置完成。 |
| 1977-12 |
Completed the manufacturing equipment for roll-to-roll flexible substrates |
| 1980-04 |
塩化第二銅エッチングシステムの日本特許を取得。 |
| 1980-04 |
Obtained a Japanese patent for the copper(II) chloride etching system |
| 1981-10 |
資本金3,000万円に増資。 |
| 1981-10 |
Increased capital to 30 million yen |
| 1981-10 |
資本金3,000万円に増資。 |
| 1985-01 |
資本金7,500万円に増資。 |
| 1985-01 |
Increased capital to 75 million yen |
| 1985-01 |
資本金7,500万円に増資。 |
| 1993-12 |
TAB用Reel to Reel製造装置を完成。 |
| 1993-12 |
Completed the reel-to-reel manufacturing equipment for TAB |
| 1994-12 |
LCD関連装置を完成。 |
| 1994-12 |
Completed LCD-related equipment |
| 2000-09 |
資本金9,750万円に増資。 |
| 2000-09 |
Increased capital to 97.5 million yen |
| 2000-09 |
資本金9,750万円に増資。 |
| 2005-03 |
薬液メーカー メルテックス（株）と業務提携、薬液と装置のマッチング推進。 |
| 2005-03 |
Formed a business alliance with chemical manufacturer Meltex Co., Ltd., promoting the matching of chemicals and equipment |
| 2008-10 |
エッチング性能を大幅に向上したエミネントIIを開発。 |
| 2008-10 |
Developed Eminent II, significantly improving etching performance |
| 2010-12 |
二流体エッチングシステムの日本特許を取得。 |
| 2010-12 |
Obtained a Japanese patent for the dual-fluid etching system |
| 2021-05 |
一期増改築製造棟竣工。 |
| 2021-05 |
Completed the first phase of the expanded and renovated manufacturing building |
| 2021-11 |
資本金３億円に増資。 |
| 2021-11 |
Increased capital to 300 million yen |
| 2021-11 |
資本金３億円に増資。 |
| 2022-07 |
第二期増築製造棟竣工。 |
| 2022-07 |
Completed the second phase of the expanded manufacturing building |
| 2022-10 |
エミネントⅡを改良し、エッチング性能を向上した『エミネントⅢの特許権利化』。 |
| 2022-10 |
Improved Eminent II and patented the enhanced etching performance of Eminent III |
| 2022-10 |
Improved Eminent II and patented the enhanced etching performance of Eminent III |
| 2023-01 |
第三期増改築製造棟竣工。 |
| 2023-01 |
Completed the third phase of the expanded and renovated manufacturing building |
