Samco Co., Ltd.

Established Samco International Institute for the manufacture and sale of semiconductor manufacturing equipment

Samco International, Inc. was established

Started development and sale of large-scale CVD (Chemical Vapor Deposition) equipment for semiconductor processes

Released large CVD system for semiconductor process

Started development and sale of domestically first MOCVD equipment for compound semiconductor manufacturing

Released Japan’s first MOCVD system

Established Tokyo branch office (current East Japan Sales Department) in Shinagawa-ku, Tokyo

Opened Tokyo branch office

Relocated head office to 33 Takenada Tanakami-cho, Fushimi-ku, Kyoto City (currently 36 Waraya-cho)

Started sales of products from US March Instruments (now Nordson)

Moved HQ to current location

Started selling products of March Instruments Inc. (now NORDSON CORPORATION)

Established OptFills Research Institute in California, USA

Opened OPTO films research laboratory in Sunnyvale

Started development and sale of CVD equipment for high-speed film formation using liquid sources

Released LSCVD® system for processing of TEOS SiO2 film

Established research and development center in Fushimi-ku, Kyoto City

Opened R&D Center I in Kyoto

Established Tsuchiura branch office (current Tsukuba Sales Office) in Tsuchiura City, Ibaraki Prefecture

Opened Tsukuba Office

Established Tokai sales office (current Tokai branch, relocated to Nagoya City in January 2020) in Nagakute-cho, Aichi-gun, Aichi Prefecture

Opened Tokai Branch

Started manufacturing and sales of ferroelectric film formation equipment using US Sinmetrix's technology

Released ferroelectric film deposition system using technology of Symetrix Corporation.

Developed basic technology for non-CFC pollution-free technology using thin film technology

Developed the CFC pollution-free technique using thin film technology

Started development and sale of compact, general-purpose plasma etching equipment RIE-10NR

Released compact reactive ion etching system RIE-10NR

Started development and sale of high-density plasma ICP etching equipment RIE-101iP

Released ICP etching system RIE-101iP

Jointly developed technology to form DLC (Diamond-Like Carbon) films on plastic bottles with Kirin Brewery Co., Ltd.

Started development and sale of compact high-density plasma ICP etching equipment RIE-200iP

Developed DLC (diamond-like carbon) film coating technology on plastic bottles in collaboration with Kirin Brewery Co., Ltd.

Released ICP etching system RIE-200iP

Established Hiroshima branch office in Asaminami-ku, Hiroshima City (closed in September 2014)

Started development and sale of compact, general-purpose plasma CVD equipment PD-220

Released compact PECVD system PD-220

Transferred the business of the service department from Samco Engineering Co., Ltd.

Acquired field support business from Samco Engineering Co., Ltd.

Established a research institute within the University of Cambridge in the UK

Opened Cambridge Research Laboratory at University of Cambridge, UK

Listed shares on the OTC market of the Japan Securities Dealers Association

Became publicly listed in JSDA Over-the-Counter Trading Securites Market

Opened a Taiwan office in Hsinchu City, Taiwan (closed in January 2009)

Opened Taiwan Office

Established a branch office in Aoba Ward, Sendai City (closed in December 2014)

Renovation work of the Production Technology Research Building (Fushimi-ku, Kyoto City) completed

Opened Production Center I in Kyoto

Started development and sales of the mass production plasma CVD equipment PD-220LC

Released production type PECVD system PD-220LC

Introduced silicon high-speed deep etching technology from Robert Bosch GmbH

Introduced high speed silicon deep etching technology from Robert Bosch GmbH

Established an office in Shanghai, China

Opened Shanghai Office

Changed the company name from Samco International Research Institute to Samco Inc.

Changed the stock trading unit from 1,000 shares to 100 shares

Cancelled OTC registration with the Japan Securities Dealers Association and listed shares on the JASDAQ Securities Exchange

Changed company name to Samco Inc.

Withdrew from JSDA Over-the-Counter Trading Securites Market and became publicly listed in JASDAQ Securities Exchange Market

Established a new Production Machinery Division (now the Product Technology Division)

Started development and sales of the general-purpose research plasma CVD equipment PD-2203L (Cluster Lab)

Released plasma CVD system PD-2203L (Cluster Lab) for general purpose

Joint development with the University of Cambridge, UK, of mass production technology for ferroelectric nanotubes, transferred to a UK company

Provided to British business the technology of mass-producing ferroelectric-carbon nanotubes which was developed together with University of Cambridge

Started development and sales of the small batch plasma processing equipment PC-300 for electronic substrate cleaning

Released compact batch-type plasma cleaning system PC-300 for cleaning electronic substrate

Established a new product service center

Opened Product Service Center

Started development and sales of dry etching equipment RIE-800iPB for MEMS

Released dry etching system RIE-800iPB for MEMS

Signed a joint research agreement with Tsinghua University, China, on nano processing technology

Signed a collaborative research agreement with Tsinghua University (China)

Started development and sales of dry etching equipment RIE-140iP/iPC for semiconductor lasers

Released ICP etching system RIE-140iP for LD

Established a second research and development building in Fushimi-ku, Kyoto City

Opened R&D Center II in Kyoto

Development and sales of Gallium Nitride film formation mass production MOCVD equipment MCV-2018 started

Released production type MOCVD system MCV-2018 for GaN film deposition

Established a local corporation for maintenance services in Taiwan, "Shamrock Co., Ltd."

Established a subsidiary, Samco Global Service Inc., in Taiwan for field support

Development and sales of Gallium Nitride wafer dedicated dry etching equipment RIE-330iP/iPC started

Released production type ICP etching system RIE-330iPC for LED

"Shamrock Co., Ltd." begins operations

Started running of Samco Global Service Inc.

Held a 30th anniversary commemorative and appreciation meeting at Kyoto Hotel Okura

Held 30th anniversary event at Kyoto Hotel Okura

Development and sales of MEMS research and development dry etching equipment RIE-400iPB started

Released R&D type dry etching system RIE-400iPB for MEMS

Listing on Osaka Securities Exchange JASDAQ market (from July 2013, Tokyo Stock Exchange JASDAQ (Standard)) following the merger of JASDAQ Securities Exchange and Osaka Securities Exchange

Became listed in Osaka Securies Exchange JASDAQ Market (now TSE JASDAQ (standard) market) as a result of the merge of Osaka Securities of Exchange, Co., Ltd. and Jasdaq Securities Exchange, Inc.

Development and sales of plasma CVD equipment PD-330STC for mass production of TSV started

Development and sales of plasma CVD equipment PD-5400 for mass production of LED started

Released production type plasma CVD system PD-330STC for TSV

Released production type plasma CVD system PD-5400 for LED

Established an office in North Carolina, USA (moved to New York State in May 2014, then to New Jersey in January 2017)

Established an office in Beijing, China

Development and sales of etching equipment RIE-331iPC for the Asian market started

Released production type ICP etching system RIE-331iPC for LED

Established a Vietnam service office in Ho Chi Minh City

Development and sales of dry etching equipment RIE-600iP for SiC power devices started

Released ICP etching system RIE-600iP for SiC power device

Listed on Tokyo Stock Exchange JASDAQ following the merger of Tokyo and Osaka Stock Exchanges

Changed to the Second Section Market of Tokyo Stock Exchange

Transferred Samco’s stock listing to Tokyo Stock Exchange Market Second Section

Development and sales of full-scale production dry etching equipment RIE-600iPC for SiC power devices started

Released production type ICP etching system RIE-600iPC for SiC power device

Development and sales of full-scale production dry etching equipment RIE-800iPBC for MEMS started

Released production type RIE system RIE-800iPBC for MEMS

Designated as a first section stock of Tokyo Stock Exchange

Transferred Samco’s stock listing to Tokyo Stock Exchange Market First Section

Signed a sales agency agreement for MOCVD equipment with Valence Process Equipment Inc. in the US

Signed distribution agreement of MOCVD systems with Valence Process Equipment Inc. (U.S.)

Acquired 90% of shares of the Principality of Liechtenstein UCP Processing Ltd. and made it a subsidiary (renamed to samco-ucp AG)

Acquired UCP Processing (Lichtenstein) as a subsidiary (Later renamed as samco-ucp AG)

Established a sales office in Fukuoka City Chuo Ward (closed in September 2021)

Opened Fukuoka Office

Increased capital to 1.6368 billion yen through a public offering

Increased capital to JPY 1.66 billion through public offering

Signed a sales agency agreement with Swedish Epiluvac AB for SiC epitaxial growth equipment

Started development and sales of atomic layer deposition equipment AL-1 for electronic devices

Signed distribution agreement of SiC epitaxial CVD system with Epiluvac AB (Sweden)

Released ALD system AL-1 for electronic devices

Completed the second production technology building (Fushimi Ward, Kyoto City)

Opened Production Center II in Kyoto

Established an office in Malaysia

Opened Malaysia Office

Started development and sales of plasma cleaning equipment AQ-2000 using Aqua Plasma®

Released Aqua Plasma® cleaner AQ-2000

Released compact ICP etching system RIE-200iPN

Held a 40th anniversary and gratitude event at Kyoto Hotel Okura

Held 40th anniversary event at Kyoto Hotel Okura

Established a demo room for CVD equipment within the second production technology building

Completed new coronavirus inactivation technology

Developed and started sales of the cluster tool system

Established a nano thin film development center within the second R&D building

Transitioned from the First Section of the Tokyo Stock Exchange to the Prime Market following a review of market segments

Started development and sales of research and development plasma ALD equipment AD-800LP

Started development and sales of multi-chamber plasma CVD equipment PD-2203LC

Initiated collaboration with Eastern Switzerland University of Applied Sciences and began market development in Europe

Commenced construction of the advanced technology development building

Started development and sales of dual chamber ALD equipment AD-8002LPC