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| オプトフィルムス研究所 | ||||||||
| サムコエンジニアリング株式会社 | ||||||||
| サムコ科学技術振興財団 | ||||||||
| リヒテンシュタイン公国UCP Processing Ltd. | ||||||||
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Samco International, Inc. was established
Released large CVD system for semiconductor process
Released Japan’s first MOCVD system
Opened Tokyo branch office
Moved HQ to current location and started selling products of March Instruments Inc. (now NORDSON CORPORATION)
Opened OPTO films research laboratory in Sunnyvale
Released LSCVD® system for processing of TEOS SiO2 film
Opened R&D Center I in Kyoto
Opened Tsukuba Office
Opened Tokai Branch
Released ferroelectric film deposition system using technology of Symetrix Corporation.
Developed the CFC pollution-free technique using thin film technology
Released compact reactive ion etching system RIE-10NR
Released ICP etching system RIE-101iP
Developed DLC (diamond-like carbon) film coating technology on plastic bottles in collaboration with Kirin Brewery Co., Ltd.
Released ICP etching system RIE-200iP
Released compact PECVD system PD-220
Acquired field support business from Samco Engineering Co., Ltd.
Opened Cambridge Research Laboratory at University of Cambridge, UK
Became publicly listed in JSDA Over-the-Counter Trading Securities Market
Opened Taiwan Office
Opened Production Center I in Kyoto
Released production type PECVD system PD-220LC
Introduced high speed silicon deep etching technology from Robert Bosch GmbH
Opened Shanghai Office
Changed company name to Samco Inc.
Withdrew from JSDA Over-the-Counter Trading Securities Market and became publicly listed in JASDAQ Securities Exchange Market
Released plasma CVD system PD-2203L (Cluster Lab) for general purpose
Provided to British business the technology of mass-producing ferroelectric-carbon nanotubes which was developed together with University of Cambridge
Released compact batch-type plasma cleaning system PC-300 for cleaning electronic substrate
Opened Product Service Center
Released dry etching system RIE-800iPB for MEMS
Signed a collaborative research agreement with Tsinghua University (China)
Released ICP etching system RIE-140iP for LD
Opened R&D Center II in Kyoto
Released production type MOCVD system MCV-2018 for GaN film deposition
Established a subsidiary, Samco Global Service Inc., in Taiwan for field support
Released production type ICP etching system RIE-330iPC for LED
Started running of Samco Global Service Inc.
Held 30th anniversary event at Kyoto Hotel Okura
Released R&D type dry etching system RIE-400iPB for MEMS
Became listed in Osaka Securities Exchange JASDAQ Market (now TSE JASDAQ (standard) market) as a result of the merge of Osaka Securities of Exchange, Co., Ltd. and Jasdaq Securities Exchange, Inc.
Released production type plasma CVD system PD-330STC for TSV
Released production type plasma CVD system PD-5400 for LED
Opened East Coast Office in North Carolina, U.S. (Relocated in New York in May 2014)
Opened Beijing Office
Released production type ICP etching system RIE-331iPC for LED
Released ICP etching system RIE-600iP for SiC power device
Transferred Samco’s stock listing to Tokyo Stock Exchange Market Second Section
Released production type ICP etching system RIE-600iPC for SiC power device
Released production type RIE system RIE-800iPBC for MEMS
Transferred Samco’s stock listing to Tokyo Stock Exchange Market First Section
Transferred Samco’s stock listing to Tokyo Stock Exchange Market First Section
Signed distribution agreement of MOCVD systems with Valence Process Equipment Inc. (U.S.)
Acquired UCP Processing (Lichtenstein) as a subsidiary (Later renamed as samco-ucp AG)
Opened Fukuoka Office
Released ALD system AL-1 for electronic devices
Increased capital to JPY 1.66 billion through public offering
Signed distribution agreement of SiC epitaxial CVD system with Epiluvac AB (Sweden)
Released ALD system AL-1 for electronic devices
Opened Production Center II in Kyoto
Opened Malaysia Office
Released Aqua Plasma® cleaner AQ-2000
Released compact ICP etching system RIE-200iPN
Held 40th anniversary event at Kyoto Hotel Okura
Started construction of the advanced technology development building
Completed the advanced technology development building (Fushimi-ku, Kyoto City)
Started development and sales of ALE equipment that achieves atomic layer level processing
Started development and sales of 2-reactor ALD equipment AD-8002LPC
To mark cumulative sales of 5,000 units of equipment including plasma CVD and dry etching systems, Samco Inc. shipped its RIE-200NL reactive ion etching system to Tohoku University. The system will be installed at a university research center and used for research and development and talent training.
Samco Corporation has announced 12 recipients for the 2026 fiscal year's research grants. Please see the official website for details.
New employees of Samco Corporation visited partner companies near Kyoto and learned about high-quality management and advanced technology through manufacturing sites.
EMBA students and faculty from VCU visited the Kyoto headquarters to learn about the company's history, semiconductor technology, and management philosophy.
Samco Corporation invited partner companies to a social gathering aimed at strengthening relationships and exchanging opinions, discussing initiatives for future collaboration.
Seven new employees joined the company and received words of welcome and encouragement from the president, who also conveyed the importance of action guidelines and the challenge of change.
The 10th research grant call for 2026 ended on March 15.
Delivered a lecture on the latest trends and market outlook of ALD technology, which is crucial for semiconductor miniaturization, to aid future technology development.
Osamu Tsuji, Representative Director and Chairman of Samco Corporation, visited the Industrial Technology Research Institute (ITRI) in Hsinchu, Taiwan, on February 2, 2026, and exchanged views on deepening cooperation, particularly in semiconductor process technology. Discussions focused on advanced technologies such as silicon photonics, optoelectronic convergence, and chiplet architectures, and also reviewed the two parties’ past cooperation. They indicated their intention to strengthen their cooperative framework, including joint research and personnel exchanges, to contribute to the development of science and technology in Japan and Taiwan.
Chairman Tsuji of Samco Corporation visited the Industrial Technology Research Institute (ITRI) in Taiwan and discussed the possibilities of semiconductor technology and joint research.